Science Journal of Circuits, Systems and Signal Processing

Volume 3, Issue 4, August 2014

  • Fault Reduction in Nonoscale VLSI Interconnection by Using Carbon Nanotubes Technology

    Behzad Lotfy, Houshang Salehi

    Issue: Volume 3, Issue 4, August 2014
    Pages: 26-30
    Received: Sep. 01, 2014
    Accepted: Oct. 25, 2014
    Published: Nov. 28, 2014
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    Abstract: As the VLSI technology scales down, significant challenges are facing the fabrication, modeling, and performance of the integrated circuits. One of the major challenges for the continuiation of the Moore’s law is “interconnects” at nano-scale. Interconnects become as important as transistors in the current technologies and will dominate the chip pe... Show More